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January 1, 2009Electrochemical and Solid-State Letters

Composition–Structure–Dielectric Property of Yttrium-Doped Hafnium Oxide Films Deposited by Atomic Layer Deposition

Qian Tao Gregory Jursich Prodyut Majumder Manish Kumar Singh Weronika Walkosz Peter Gu Robert F. Klie Christos G. Takoudis

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Abstract

Composition–Structure–Dielectric Property of Yttrium-Doped Hafnium Oxide Films Deposited by Atomic Layer Deposition, Tao, Qian, Jursich, Gregory, Majumder, Prodyut, Singh, Manish, Walkosz, Weronika, Gu, Peter, Klie, Robert, Takoudis, Christos

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Tao et al. (2009) studied this question.

synapsesocial.com/papers/6a977993618eaafe842d1cd7 https://doi.org/10.1149/1.3156833

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