Synapse
⌘+K
Synapse
PulseExploreClubsResearchersJournals
Instagram
HomeClubsExplore
April 1, 1996Journal of The Electrochemical Society

Ultrathin Silicon Nitride Films Fabricated by Single‐Wafer Processing Using an SiH2Cl2 ‐ NH 3 ‐ H 2 System and In Situ H 2 Cleaning

View Full Paper
Ask AI
Bookmark
Share

Authors

KKK. KobayashiSetsunan UniversityYIYutaka InabaRenesas Electronics (United States)TOTamotsu Ogata

Discussion

Loading...

Member takes

Implication

Key Points

Key points are not available for this paper at this time.

Cite This Study

Kobayashi et al. (1996) studied this question.

synapsesocial.com/papers/6a978b98dfe10a478e9da174https://doi.org/10.1149/1.1836659
View Full Paper
Ask AI
Bookmark
Share