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The series of three diamond-like carbon films was fabricated using Plasma – Enhanced Chemical Vapor Deposition setup designed for deposition of amorphous silicon films. The deposited films were analyzed by Spectroscopic ellipsometer Semilab SE-2000 in terms of optical properties. All the measurements were analyzed and modeled by the Fresnel equations. Three parameters were identified: refractive index, extinction index, and thickness. The range of these values indicates that the films can be used as antireflection coatings. The obtained values for n, k, and d are located in ranges: for n - 1.484 and 1621, for k - 0.345 and 0.062, and for d- 136.20 and 74.66.
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Zelinskyi et al. (2020) studied this question.
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