Measurements of Electroluminescence Intensity Distribution in the Direction of Gate Width of n+ Self-Aligned Gate GaAs Metal-Semiconductor Field-Effect Transistors

We studied electroluminescence (EL) intensity distributions in the direction of gate width of n+ self-aligned gate GaAs metal-semiconductor field-effect transistors (MESFETs). Nonuniform EL was observed along the gate-width direction, suggesting the nonuniform high-field formation in the direction of the gate. It has also been found that the EL at the source side shows gentler distribution than that at the drain side. These features suggest that the nonuniform hole distribution generated by impact ionization at the drain side becomes gradual during the process of their flow into the source and gate electrodes.