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This paper reports a simple and scalable spin-coating technique for assembling 70 nm silica nanoparticles into non-close-packed colloidal crystals over a large area. The thickness of the shear-aligned colloidal crystals can be controlled from hundreds of layers to a single monolayer by adjusting the spin-coating conditions. We further demonstrate that the spin-coated colloidal monolayers can be used as structural templates to pattern sub-100 nm pillar arrays directly on silicon substrates. The resulting subwavelength-structured pillar arrays exhibit excellent broadband antireflective and superhydrophobic properties, which are promising for developing self-cleaning antireflection coatings for crystalline silicon solar cells. This bottom-up approach enables large-scale production of periodic nanostructures with resolution beyond the optical diffraction limit that have important technological applications ranging from high-density data storage and optoelectronics to biological sensing and subwavelength optics.
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Min et al. (2008) studied this question.
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