Ar ion beam etching and inductively coupled SF6 and C4F8 plasma-etching processes have been employed to fabricate free standing membrane from the heteroepitaxial La1−x(Sr,Ca)xMnO3(50nm)∕Bi4Ti3O12(100nm)∕CeO2(40nm)∕YSZ(30nm) film structure pulsed laser deposited on Si(001) wafer. We demonstrate feasibility to use epitaxial colossal magnetoresistive manganite film as thermally isolated self-supporting membrane for uncooled infrared microbolometer applications.
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Kim et al. (2005) studied this question.
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