Focused ion beam milling of gallium phosphide nanostructures for photonic applications

We report on the fabrication of gallium phosphide (GaP) nanowaveguides of controlled dimensions, as small as 0.03 μm and aspect ratio in excess of 20, using focused ion beam (FIB) milling. A known limitation of this fabrication process for photonic applications is the formation of gallium droplets on the surface. We demonstrate a post-fabrication step using a pulsed laser to locally oxidize the excess surface gallium on the FIB milled nanostructures. The process significantly reduces the waveguide losses. The surface optical quality of the fabricated GaP nanowaveguides has been evaluated by second-harmonic generation experiments. Surface and bulk contributions to second-order optical nonlinearities have been identified by polarization measurements. The presented method can potentially be applied to other III-V nanostructures to reduce optical losses.