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July 1, 2010Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and PhenomenaOpen Access

Dual exposure, two-photon, conformal phase mask lithography for three dimensional silicon inverse woodpile photonic crystals

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Authors

DSDaniel ShirCalifornia NanoSystems InstituteENErik C. NelsonDCDebashis ChandaUniversity of Central Florida

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Shir et al. (2010) studied this question.

synapsesocial.com/papers/6a97dde0161d47660415e32bhttps://doi.org/10.1116/1.3456181
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