We report a process for preparing microdot arrays of SiO 2 from a tetraethoxysilane precursor containing either a cationic (CTAB) or non‐ionic surfactant. Controlling the ink jet deposition parameters and precursor hydrolysis made it possible to obtain mesoporous silica with a Pm 3 n cubic structure, using CTAB, or an Fmmm orthorhombic structure, using a non‐ionic surfactant. The addition of hydrophobic organosilane F 3 C(CF 2 ) 5 CH 2 CH 2 Si(OC 2 H 5 ) 3 leads to the most regular and best‐defined three‐dimensional microdot array with a constant diameter of 155 μm and a regular space of 250 μm.
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Mougenot et al. (2006) studied this question.
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