We proposed an oxygen modulation method for the growth of high crystalline and insulative anatase films. The cycle of deposition under low oxygen pressure and annealing under high oxygen pressure was repeated every 1nm thick growth. The sharp reflection high-energy electron diffraction pattern and step-and-terrace surface morphology confirmed high crystallinity of the obtained anatase film; the resistivity reached as high as 1.8MΩcm. As a result, the present anatase film exhibited high performance in a field-effect transistor as an active channel. On-to-off current ratio and field-effect mobility exceeded 105 and 0.3cm2∕Vs, respectively.
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Katayama et al. (2008) studied this question.
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