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April 1, 1990Japanese Journal of Applied Physics

Dependence of ECR Plasma Etching Characteristics on Sub Magnetic Field and Substrate Position

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SSSeiji SamukawaNational Yang Ming Chiao Tung UniversitySMSumio MoriHouju Memorial HospitalMSMasami SasakiTamagawa University

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Samukawa et al. (1990) studied this question.

synapsesocial.com/papers/6a98ec77164ba63a391fecb1https://doi.org/10.1143/jjap.29.792
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