Synapse
⌘+K
Synapse
PulseExploreClubsResearchersJournals
Instagram
HomeClubsExplore
April 1, 1983Japanese Journal of Applied Physics

Low Temperature Chemical Vapor Deposition Method Utilizing an Electron Cyclotron Resonance Plasma

View Full Paper
Ask AI
Bookmark
Share

Authors

SMSeitaro MatsuoKyushu UniversityMKMikiho KiuchiNTT Basic Research Laboratories

Discussion

Loading...

Member takes

Implication

Key Points

Key points are not available for this paper at this time.

Cite This Study

Matsuo et al. (1983) studied this question.

synapsesocial.com/papers/6a6fbbd92163a0a01bc40027https://doi.org/10.1143/jjap.22.l210
View Full Paper
Ask AI
Bookmark
Share

Also Consider

Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context:

  1. 1Reactive Ion Beam Etching Using a Broad Beam ECR Ion Source1982 · 150 citations
  2. 2Plasma stream transport method (1) Fundamental concept and experiment1978 · 27 citations
  3. 3Microwave Plasma Etching1977 · 238 citations
  4. 4Production of Large Area High Current Ion Beams1972 · 34 citations
  5. 5NEW HIGH INTENSITY ION SOURCE WITH VERY LOW EXTRACTION VOLTAGE1970 · 46 citations