According to the absorption characteristics the o ‐nitrobenzyl group is well suited for deep‐UV lithography. We have investigated copolymers of o ‐nitrobenzyl acrylates with aliphatic and aromatic comonomers with respect to optical density, dissolution discrimination, glass transition temperature, and plasma etching resistance. Aromatic comonomers like p ‐hydroxy‐ or p ‐( t ‐butoxycarbonyloxy) styrene have proven most useful in lithographic examinations. The effects of polymer structure on resist sensitivity, contrast, resolution, and etching resistance are described.
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Reinhold Schwalm (1989) studied this question.
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