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Rapid advances in information technology rely on novel patterning techniques. The authors present a simple UV capillary force lithography process, which allows one to imprint a multiscale system, consisting of 250 nm wide nanobridges and a 8–20 μm wide wiring in one lithography step. An additional annealing step for 5 min at 75 °C improved the capillary rise.
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Hansen et al. (2012) studied this question.
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