Experimental study demonstrates silica encapsulation via thiol-ene reactions protects photoluminescent thin films, highlighting a durable pathway for preventing atmospheric degradation.
We introduced a silane coupling agent bearing a thiol group as a sol-gel precursor and dispersed photoluminescent materials within it to create an organic/inorganic hybrid photoluminescent material. Upon ultraviolet (UV) irradiation, a thiol-ene reaction occurs, encapsulating the photoluminescent material within silica. Thin films were fabricated using spin coating, and their luminescence properties and encapsulation performance were evaluated. The results showed that the encapsulation structure using SiO₂ effectively suppressed atmospheric degradation of the photoluminescent material in photoluminescence (PL) measurements.
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Miyashiro et al. (2026) studied this question.
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