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We report on the fabrication and characterization of Au-free Ti/Al/TiN-based ohmic contacts on 200 mm AlGaN/GaN epilayers for power devices. Materials and processing used are fully compatible for integration of GaN-based devices in a Si platform. Contact resistance values as low as 0.62 Ω·mm were measured for an optimum alloy temperature as low as 550 °C.
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Firrincieli et al. (2014) studied this question.
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