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To date thin films of II(a) fluorides (CaF2, BaF2, SrF2, and their mixtures) have only been deposited by physical vapor deposition techniques. We report for the first time the deposition of BaF2 films on silicon and yttrium-stabilized zirconia substrates by metalorganic chemical vapor deposition at a substrate temperature as low as 400 °C.
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Singh et al. (1989) studied this question.
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