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April 15, 1987Journal of Applied Physics

Mechanisms of deposition and etching of thin films of plasma-polymerized fluorinated monomers in radio frequency discharges fed with C2F6-H2 and C2F6-O2 mixtures

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Authors

RDRiccardo d’AgostinoGeological Society of London FCF. CramarossaUniversity of Bari Aldo Moro FIFrancesca IlluzziSTMicroelectronics (Czechia)

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Cite This Study

d’Agostino et al. (1987) studied this question.

synapsesocial.com/papers/6a9adc08307835d6b3fc67ea https://doi.org/10.1063/1.337864

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