Trap levels in the atomic layer deposition-ZnO/GaN heterojunction—Thermal admittance spectroscopy studies

In this work, a n-ZnO/p-GaN heterojunction is analyzed using admittance spectroscopy techniques. Capacitance transient measurements performed at 10 kHz reveal four majority-carrier deep levels, the most important one located at approximately 0.57 eV below the ZnO conduction band (CB) edge with a density about two orders of magnitude below the doping level (NT = 4 × 1015 cm−3). The others, located at 0.20 eV, 0.65 eV, and 0.73 eV, are about three orders of magnitude below the doping level (NT = 4–9 × 1014 cm−3).