Simulation has become a very effective means of understanding tradeoffs which arise in implementing innovation in optical projection printing. A number of examples associated with current concerns in image formation under investigation at Berkeley using the SPLAT, SAMPLE and TEMPEST simulators are described. The examples include diffusion effects in chemically amplified resists, imaging in thin films with high numerical aperture lenses, image quality in an exploratory extreme ultra violent (X-ray) system developed by Wood et al. [J. Vac. Sci. Technol. B 7 (1989) 1613] of AT & T, printability of out-of-focus phase-shift defects, edge effects in phase-shift masks, and scattering from underlying topography.
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Andrew W. Neureuther Andrew W. Neureuther (1993) studied this question.
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