Si(100) surfaces treated by ultrapure water with 5 ppb dissolved oxygen concentration after dipping in HF solution were examined by attenuated total reflection (ATR)–Fourier-transform infrared (FT-IR) spectroscopy, transmittance FT-IR, and reflection high energy electron diffraction (RHEED). FT-IR spectra and RHEED patterns depended on the rinsing time in the ultrapure water. The (111) and (110) facets appeared after rinsing for a long period of time (20–45 h) in 5 ppb dissolved oxygen concentration ultrapure water. It was suggested that the surface morphology depended on not only pH value but also the amount of etching.
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Kanaya et al. (1995) studied this question.