Following intensive research and development, Suntech Power has successfully commercialised its Pluto technology with 0.5 GW annual production capacity, delivering up to 10% performance advantage over conventional screen‐printed cells. The next generation of Pluto involves the development of improved rear surface design based on the design features of passivated emitter and rear locally diffused cells. Cells with an average efficiency over 20% were fabricated on 155 cm2 commercial‐grade p‐type wafers using mass‐manufacturing processes and equipment, with the highest single‐cell efficiency independently confirmed at 20.3%. This is believed to be a record efficiency for this wafer type. Further optimisation work on contact pattern and rear surface passivation suggests the potential for further efficiency increase approaching 23%.
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Wang et al. (2012) studied this question.
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