Answers are grounded in this paper and cite their sources.
Ion plasma deposition with simultaneous ion bombardment is one of the most promising techniques to improve the structure and properties of coatings. These effects are strongly dependent on the ion irradiation characteristics (current density, energy, etc.). A program based on molecular dynamics simulation has been developed to model ion assisted deposition. The model predicts film surface smoothing, improvement of stoichiometry, and some other effects which are discussed and compared with the experimental data.
No takes yet. Share an insight, caveat, or question.
Byeli et al. (1994) studied this question.
Synapse has enriched 10 related papers. Consider them for comparative context: