Facets observed adjacent to insulator films in selective silicon epitaxial growth were studied. The facet formation depended on the crystallographic orientation of the openings, and facets did not appear adjacent to the SiO2 sidewall parallel to the [100] direction. Facet formation could also be suppressed by using a polysilicon-coated sidewall. Defects in the selective epi-layers were examined using transmission electron microscopy, and facet-free and defect-free epilayers were obtained.
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Ishitani et al. (1985) studied this question.
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