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January 1, 1991Journal of the Chemical Society Faraday Transactions

Faraday communications. EXAFS evidence for the formation of a V2O5 thin film by chemical vapour deposition on SiO2

Kei Inumaru Toshio Okuhara Makoto Misono Nobuyuki Matsubayashi Hiromichi Shimada Akio Nishijima

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Abstract

V K-edge EXAFS studies of V2O5/SiO2 catalysts prepared by a chemical vapour deposition (CVD) method demonstrate the formation of V2O5 thin films, while the V2O5 of V2O5/SiO2 prepared by an impregnation method is mainly in the form of microcrystallites.

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Inumaru et al. (1991) studied this question.

synapsesocial.com/papers/6a9bffde2782e6faf39086e6 https://doi.org/10.1039/ft9918701807

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