Surface patterning of copolymers via self-assembly is achieved by substrate design. The figure shows a polystyrene-block-poly(methyl methacrylate) symmetric diblock copolymer confined in a tapered structure. Engineering the channel structure provides local defectivity control for defect-free striped lamellar patterns at the nanometer scale.
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Ruiz et al. (2007) studied this question.
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