The Requirements for Future Electron-Beam Reticle Fabrication Systems from an Error Analysis Viewpoint

To pave the way for giga-scale reticle fabrication, error analysis in the development of an electron-beam reticle fabrication system for 0.3 µm production and 0.2 µm development of devices is re-examined. To improve the stitching accuracy, it is necessary to constrain some kinds of mechanical vibration. For higher pattern width accuracy, higher accelerating voltage and thorough proximity correction are needed. To realize ultimate positioning accuracy, it is important to control fluctuation in reticle temperature precisely. The analysis results strongly suggest that it is necessary to constrain environmental disturbances. Control technology that minimizes the influence of disturbances and a design strategy established from this guideline will be needed in the not so distant future. This paper discusses requirements of a giga-scale electron-beam reticle fabrication system from an error-analysis viewpoint.