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We report a facile method for creating nanoscopic oxide structures over large areas that is capable of producing high aspect ratio nanoscale structures with feature sizes below 50 nm. A variety of nanostructured oxides including TiO(2), SnO(2) and organosilicates are formed using sol-gel and nanoparticle precursors by way of molding with water-soluble polymeric templates generated from silicon masters. Sequential stacking techniques are developed that generate unique 3-dimensional nanostructures with combinatorially mixed geometries, scales, and materials. Applicable to a variety of substrates, this scalable method allows access to a broad range of new thin film morphologies for applications in devices, catalysts, and functional surface coatings.
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Bass et al. (2011) studied this question.
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