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Ultrathin Tantalum Oxide Capacitor Dielectric Layers Fabricated Using Rapid Thermal Nitridation prior to Low Pressure Chemical Vapor Deposition, Kamiyama, Satoshi, Lesaicherre, Pierre‐Yves, Suzuki, Hiroshi, Sakai, Akira, Nishiyama, Iwao, Ishitani, Akiniko
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Kamiyama et al. (1993) studied this question.
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