Answers are grounded in this paper and cite their sources.
We present the development of a magnetron sputtering process for the fabrication of exclusively c-axis oriented LiNbO3 thin films on silicon substrates. The heterostructure consists of LiNbO3/Si3N4/SiO2/Si. The deposition of the Si3N4 film is key to obtaining exclusively c-oriented LiNbO3 thin films. The deposition conditions for the LiNbO3 are discussed.
No takes yet. Share an insight, caveat, or question.
Tan et al. (1996) studied this question.
Synapse has enriched 10 related papers. Consider them for comparative context: