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The polyvinyl alcohol (PVA) film coating effect on novolac-based positive electron resist (NPR) has been studied in X-ray lithography using a Si X-ray source in an atmospheric environment. Extremely striking deterioration in NPR sensitivity was observed in an atmospheric environment compared with in vaccum. It was also found that the sensitivity deterioration was to a greater extent improved by using the PVA/NPR scheme.
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Okada et al. (1985) studied this question.
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