Views Icon Views Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Icon Share Twitter Facebook Reddit LinkedIn Tools Icon Tools Reprints and Permissions Cite Icon Cite Search Site Citation L. Stafford, W. T. Lim, S. J. Pearton, M. Chicoine, S. Gujrathi, F. Schiettekatte, Jae-Soung Park, Ju-Il Song, Young-Woo Heo, Joon-Hyung Lee, Jeong-Joo Kim, I. I. Kravchenko; Influence of the film properties on the plasma etching dynamics of rf-sputtered indium zinc oxide layers. J. Vac. Sci. Technol. A 1 July 2007; 25 (4): 659–665. https://doi.org/10.1116/1.2736679 Download citation file: Ris (Zotero) Reference Manager EasyBib Bookends Mendeley Papers EndNote RefWorks BibTex toolbar search Search Dropdown Menu toolbar search search input Search input auto suggest filter your search All ContentAVS: Science & Technology of Materials Interfaces and ProcessingJournal of Vacuum Science & Technology A Search Advanced Search |Citation Search
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Stafford et al. (2007) studied this question.
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