Large area manufacturing of plasmonic colour filters using substrate conformal imprint lithography

This work presents the large area fabrication of plasmonic colour filters consisting of subwavelength apertures in aluminium films of different thicknesses. Wafer-scale pattern transfer was realized by a soft lithography technique (substrate conformal imprint lithography). The fabricated colour filters have an active area of up to 145 cm 2 which presents a considerable increase compared to previously published results. In addition to experimental investigations, simulations of the transmission behaviour were performed using a rigorous electromagnetic field solver based on an extended RCWA approach. Furthermore, the use of a spin-coated cover layer consisting of the UV-curable hybrid polymer OrmoComp ® instead of often applied PECVD-SiO 2 was investigated.