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March 1, 2010Journal of SemiconductorsOpen Access

Fluid model of inductively coupled plasma etcher based on COMSOL

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LJLinhong JiTsinghua UniversityZYZhu YuYSYixiang ShiKarlsruhe Institute of Technology

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Ji et al. (2010) studied this question.

synapsesocial.com/papers/6a9e8a1a147f9088f4f6c8d4https://doi.org/10.1088/1674-4926/31/3/032004
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