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January 1, 1995IEEE Transactions on Plasma Science

Two-dimensional simulation of polysilicon etching with chlorine in a high density plasma reactor

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Authors

DLDimitris P. LymberopoulosApplied Materials (United States)DEDemetre J. EconomouUniversity of Houston

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Lymberopoulos et al. (1995) studied this question.

synapsesocial.com/papers/6a8bc37cc12eaf65c8b21762https://doi.org/10.1109/27.467977
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