A maskless method for patterning substrates using surface relief structures on azobenzene‐functionalized polymer is demonstrated. Surface relief structures are inscribed on a polymer film spin‐coated on an indium tin oxide (ITO) substrate by exposure to an interference pattern. Etching with oxygen plasma followed by a zinc‐powder‐catalyzed liquid etchant yields a periodically patterned ITO substrate (see Figure).
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Yang et al. (2004) studied this question.
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