Oxidation of silicon in dry oxygen ambient at temperatures between 25°C to 500°C, with a point-to-plane corona discharge is studied. The oxidation rate for this case is a strong function of temperature and is found to increase significantly in comparison to the conventional thermal oxidation rate. For the thicker films, refractive index of the grown oxide layer approaches the value obtained for high-temperature thermally grown oxide.
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Madani et al. (1988) studied this question.
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