The influence of power and substrate temperature on chemical composition, determined by ESCA, of the inductively coupled RF plasma polymerization of acrylonitrile

The influence of power and substrate temperature on the chemical composition of inductively coupled RF plasma‐polymerized films of acrylonitrile was monitored by ESCA. At a substrate temperature of 20°C a minimum in nitrogen content as a function of power was observed for films deposited in the coil region. A maximum was observed for a substrate temperature of 150°C. When power was increased from 1 to ∼50 W a linear increase in nitrogen content was observed in the tail region at both substrate temperatures. A step function observed in the C1s and N1s core‐level spectra is discussed in terms of extensive unsaturation being present in the films.