Chemical vapor deposition (CVD) of palladium is at present not used commercially, despite the widespread use of palladium films in electronics and data storage, because suitable precursors are not available. New palladium precursors, ally (β‐diketonato)palladium(II) complexes (see Figure) are reported, along with the conditions required for the formation of pure palladium films by CVD. magnified image
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Yuan et al. (1994) studied this question.
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