Field-Emission Characteristics of Hydrogenated Amorphous Carbon Films Prepared by Surface Wave Plasma

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Hydrogenated amorphous carbon films are prepared by a 40-cm-diameter planar surface wave plasma to apply them to field-emission display. The 2.45 GHz surface wave plasmas at 700 W give a film deposition rate of ∼15 nm/min in He gas mixed with a small amount of methane gas at a relatively low pressure of 100 to 200 mTorr. Preliminary experimental results show that the hydrogenated amorphous carbon films deposited on silicon substrates have good field-emission characteristics: a threshold electric field defined at 1 µA/cm2 was roughly 4 V/µm and an emission current of 0.1 mA/cm2 was achieved at an electric field of 7.5 V/µm.