Surface Modification with Orthogonal Photosensitive Silanes for Sequential Chemical Lithography and Site‐Selective Particle Deposition

Monolayer lithography: The concept of orthogonal cleavage of photolabile protecting groups was demonstrated with self-assembled silane layers on solid surfaces. Nitroveratryloxycarbonyl and benzoin derivatives can be addressed independently by light of different wavelengths to selectively liberate amino and carboxylic acid groups, respectively, in mixed silane layers. Specific colloid adsorption on such photopatterned surfaces was investigated.