Direct fabrication of two-dimensional titania arrays using interference photolithography

Two-dimensional (2D) titania arrays with periods of 0.8–2.0 μm were fabricated by polymerization of a photosensitive titanium-containing monomer film using interference photolithography. The 2D precursor arrays were prepared by exposing a mixture of methacrylic acid, ethyleneglycol dimethacrylate, and titanium ethoxide doped with photoinitiator to 355 nm, 15 ns pulses from a Nd-Yttrium–aluminum–garnet laser and then rinsing with methanol. Pure titania arrays were obtained from the precursor arrays by subsequent calcination at 575 °C. The structure of the arrays fabricated by this method was confirmed with optical microscopy and scanning electron microscopy.