High Photoresponsivity and Short Photoresponse Times in Few-Layered WSe2 Transistors

Here, we report the photoconducting response of field-effect transistors based on three atomic layers of chemical vapor transport grown WSe 2 crystals mechanically exfoliated onto SiO 2 . We find that trilayered WSe 2 field-effect transistors, built with the simplest possible architecture, can display high hole mobilities ranging from 350 cm 2 /(V s) at room temperature (saturating at a value of ∼500 cm 2 /(V s) below 50 K) displaying a strong photocurrent response, which leads to exceptionally high photoresponsivities up to 7 A/W under white light illumination of the entire channel for power densities p < 10 2 W/m 2 . Under a fixed wavelength of λ = 532 nm and a laser spot size smaller than the conducting channel area, we extract photoresponsitivities approaching 100 mA/W with concomitantly high external quantum efficiencies up to ∼40% at room temperature. These values surpass values recently reported from more complex architectures, such as graphene and transition metal dichalcogenides based heterostructures. Also, trilayered WSe 2 phototransistors display photoresponse times on the order of 10 μs. Our results indicate that the addition of a few atomic layers considerably decreases the photoresponse times, probably by minimizing the interaction with the substrates, while maintaining a very high photoresponsivity.