Three-dimensional diamond-like carbon mold fabricated by focused-ion-beam chemical vapor deposition (FIB–CVD) using a precursor of phenanthrene has been applied to a nanoimprint lithography (NIL) process. The mold has a very smooth surface, which is one of the advantages for the fabrication of optical devices. FIB–CVD uses a Ga+ beam control system which convert three-dimensional computer aided design data into the scanning signal and is capable of fabricating any shape of optical device mold surface such as a microlens. The microlens molds have been replicated onto poly(methylmethacrylate) (PMMA) and hydrogen silsequioxane using NIL. A microlens of polydimenthyl siloxane has been fabricated by replication using the PMMA reversal mold fabricated by NIL using the FIB–CVD mold.
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Watanabe et al. (2003) studied this question.
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