Boosting Solar Cell Efficiency Through Plasma-Driven Light Management Strategies: A Review

Background: The optical losses in the form of reflections, parasitic absorption, and scattering limit photovoltaic efficiency. This review examines plasma-assisted surface engineering as an effective tool for improving light management in solar cells. Plasma-based methods, including etching, oxidation, deposition, and texturing, enable precise control of surface morphology and chemistry, lowering reflectance, enhancing light trapping, and passivating defects. Methods: In contrast to wet-chemical or high-temperature processes, plasma processes are dry, low-temperature, scalable, and can be used with silicon, perovskite, thin-film, and organic solar cells, as well as tandem structures. The fundamentals of optical losses are described, along with the principles of radio-frequency (RF), inductively coupled plasma (ICP), microwave, and atmospheric plasma systems and their distinctive advantages for controlling ion and reactive-species generation. Key applications reviewed include black-silicon texturing by ICP reactive-ion etching (ICP-RIE), anti-reflective/passivation coatings by plasma-enhanced chemical vapor deposition (PECVD), and interface activation by atmospheric plasma. Results: Among performance improvements are a reflectance of less than 2%, a photocurrent increase of 10–20%, and longer carrier lifetime. Conclusions: The advantages of plasma compared to lithography and sol–gel processes are in the precision and affordability of the method. The difficulties include damage caused by the processing, uniformity over extensive areas, and environmental stress resistance. Future directions rely on low-temperature plasmas for flexible PV, machine-learning-guided process optimization, and hybrid plasma–laser systems. This synthesis of otherwise fragmented studies is intended to support the implementation of plasma-based methods in next-generation, high-efficiency, and sustainable solar production.