Use of ion beams to decompose metalorganics into patterned thin-film superconductors

Ion implantation of 400 keV O+2 ions, at a dose of 5×1014 ions/cm2, was used to selectively decompose a high Tc superconductor-forming metalorganic (MO). Implantation rendered the metal carboxylates insoluble in their solvent, xylene, permitting patterning of the MO prior to pyrolysis and annealing. Fine line superconductors were formed having 90 K onset temperatures and zero resistance at 68 K.