Oxide scalability in Al2O3∕Ga2O3(Gd2O3)∕In0.20Ga0.80As∕GaAs heterostructures

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The scalability of molecular beam epitaxy grown Ga2O3(Gd2O3)∕In0.2Ga0.8As∕GaAs with in situ Al2O3 capping layers has been studied, in which the InGaAs surface Fermi level has been unpinned. The electrical and structural properties were improved with rapid thermal annealing to high temperatures of 800°C under N2 flow. As Ga2O3(Gd2O3) is scaled down to 8.5nm, the dielectric constant maintained at 14–15, similar to those of thicker oxides, resulting in an equivalent oxide thickness of 2.3nm. A low gate oxide leakage current density of 10−9A∕cm2 at ∣VG−Vfb∣=1, small flatband voltage shift (ΔVfb), low interfacial density of states (Dit) of (1–3)×1011cm−2eV−1 have been achieved.