The position of Ga and As atoms at monolayer coverages of heteroepitaxial GaAs on clean Si(111) have been measured by x-ray standing waves in UHV. Though both As and Ga are incident on the surface As atoms choose to occupy the upper half of the (111) double plane about 5% higher on the average, relative to the Si(111) d spacing, than the bulk silicon position. Ga atoms are exclusively located on the lower half of the (111) plane about 3% higher than the corresponding bulk positions.
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Patel et al. (1987) studied this question.
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