Direct Fabrication of Photonic Crystal on Glass Substrate by Nanoimprint Lithography

We have successfully fabricated a two-dimensional photonic crystal with a 300 nm period on a glass substrate by direct nanoimprint lithography. A uniform photonic crystal with an area of 3 ×3 mm 2 was obtained at the relatively low temperature of 360°C. Our results can be applied to make various photonic-nanostructure devices.