Plasma polymerization of silane compounds has been discussed for deposition of SiOx positron emission tomography (PET) films at room temperature. A mixture of tetramethoxysilane (TMOS) and oxygen containing 60 mol % O2 is a preferable raw material for SiOx formation by plasma polymerization. The deposited plasma polymers consist mainly of Si(SINGLE BOND)O networks with small amount of Si(SINGLE BOND)OH and Si(SINGLE BOND)C groups. A part of Si(SINGLE BOND)O networks in the plasma polymers is distorted by the Si(SINGLE BOND)OH and Si(SINGLE BOND)C groups. The oxygen permeability coefficient for the plasma polymer itself is 2.1 × 10−15 (STP) cm3/cm/cm2/s/cm Hg, which is lower than that for hydrolyzed ethylene-vinylacetate copolymer (Eval) and poly(vinylidene chloride) (Saran). Conclusively, the plasma polymer deposited from the mixture of TMOS and oxygen containing 60 mol % O2 is a material with good oxygen barrier properties.
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Inagaki et al. (1997) studied this question.